Your best choice for precision metal


Sputtering Target





SPUTTERING TARGETS

Haohai Titanium provides specialty metal(especially titanium) thin film PVD chemicals in a wide variety of sputtering target configurations according to client's requirements. Material properties and forms are optimized for individual chamber types and deposition processes. 

Our in-house material synthesis and manufacturing operations enable us to provide market-leading value in sputtering targets:
 
Our Advantages:


- Optimum grain size and uniform microstructure assure consistent process performance thru full end of life.
- Complete homogeneity and high purity levels produce uniform, consistent coverage.
- High density materials enable longer coating runs, reducing the frequency of chamber downtime for target replacement and associated equipment maintenance.
- Our experience in metal materials and challenging applications is what makes Haohai Titanium as our customers’ First Choice for the development and production of innovative new products.
 


Our promise:
 
Due to our rigorously monitor our product quality and manufacturing processes, Haohai Titanium has the technology and expertise to supply superior metal thin film sputtering targets to any size operation, from R&D to full-scale production.
 
Our comprehensive suite of support services includes:

- High quality new sputtering targets 
- Sputtering target bonding and debonding
- Backing plate refurbishment
- High value material refining
- The combination of our material and service offerings provides you with the lowest total cost of your sputtering process.




Our targets widely use in fields as following:

- Targets for the FLAT Pannel Display Industry
- Targets for Architecural and Automotive glass, web coating
- Targets for Solar PV & Solar heating
- Targets for surface Engineering(Decoration and Tool & Die)
- Targets for IC and Electronic Coating




Cathodic Arc Targets

Cathodic Acr Targets (Surface Engineering)
Item Purity Density Shape Normal Sizes
(Diameter, mm)
Industry
Ti 2.5N - 4N 4.51 Cylinder Acc. to demand Decorate
Tools
TiAl 2.8N - 4N 3.6 - 4.2
Cr 2.7N - 4N 7.19
Zr 2.5N - 4N 6.5
Al 4N - 5N 2.7
Ni 3N - 4N 8.9
NiV 3N 8.57
Nb 3N 8.57
Ta 3.5N 16.4
Mo 3.5N 1.2
Other materials and sizes are available for request.










 


Magnetron Sputtering Targets(Rotary Targets)
 
Rotary Targets
    Item        Purity       Density  Shape Normal Sizes
(Diameter, mm)
Industry
Ti 2.5N - 4N 4.51 Rotary
Tube
SCI Types
Acc. to drawings
Display
Glass Coating
Solar Energy Thin Film
TiAl 2.8N - 4N 3.6 - 4.2
Cr 2.7N - 4N 7.19
Zr 2.5N - 4N 6.5
Al 4N - 5N 2.7
Ni 3N - 4N 8.9
Cu
(Copper)
3N - 4.5N 8.57
Cu
(Brass)
3N - 5N 8.92
Other materials and sizes are available for request.













Magnetron Sputtering Targets(Planar targets)
 
Planar Targets
    Item        Purity       Density  Shape Normal Sizes
(Diameter, mm)
Industry
Ti 2.5N - 4N 4.51 Planar Acc. to requirements Display
Glass Coating
Solar Energy Thin Film
Others


 
TiAl 2.8N - 4N 3.6 - 4.2
Cr 2.7N - 4N 7.19
Zr 2.5N - 4N 6.5
Al 4N - 5N 2.7
Ni 3N - 4N 8.9
Cu 3N - 4.5N 8.92
Nb 3N 8.57
Ta 3.5N 16.4
Mo 3.5N 10.2
Other materials and sizes are available for request.










Please just send us your drawings and requirements to sales@hhtitan.com, you can trust that we will provide your high quality and purity targets meet your exacting specifications.