Haohai Titanium is your best choice for Monolithic rotary sputtering targets for PVD Thin Film Technology. Our rotary sputtering targets by materials of Titanium, Zirconium, Chromium, Hafnium, Niobium, Tantalum, Molybdenum, NbOx and SiAl etc.
ROTATABLE SPUTTERING TARGETS
We focus on customer requirements and provide effective solutions based on over 15 year of experience, and our rotatable targets is our core products. Haohai Titanium is your best choice for Monolithic rotary sputtering targets for PVD Thin Film Technology.
Compared to planar configurations, Haohai cylindrical sputtering targets offer:
- Reduce the cost of ownership for large area coating operations
- Variety of materials including
- Optimum grain size and uniform microstructure assure consistent process performance through full end of life
- Complete homogeneity and high purity levels produce consistent coverage
- Able to supply materials to any size operation from R&D to full-scale production
Fabrication processes vary based on material composition, application process and product end use, our targets manufacturing methods including:
> Vacuum melting
> Inert gas hot-pressing
> Precision machining
Our Main Products: